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Photoelectric conversion; solar cells and arrays

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  • Physics [2]
  • Condensed matter: structure, thermal and mechanical properties [2]
  • Surfaces and interfaces; thin films and whiskers [2]
  • Thin film growth, structure, and epitaxy [2]
  • Cross-disciplinary physics and related areas of science and technology [2]
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  • Methods of thin film deposition [2]
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Microcrystalline and polycrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method
Author(s): R. Bilyalov, J. Poortmans, R. Sharafutdinov, S. Khmel, V. Schukin, O. Semenova, L. Fedina
Source: IEE Proceedings - Circuits, Devices and Systems, Volume 150, Issue 4, 2003 , p. 293 - 299
Type: Article
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A new gas-jet electron beam plasma enhanced chemical vapour deposition (GJEB PECVD) method for high-rate deposition of crystalline silicon films is presented. The method is based on the activation of initial gas molecules in an electron beam plasma and fast convective transfer of the radicals to a substrate by means of a supersonic free jet. Nanocrystalline, microcrystalline and polycrystalline Si film growth on different foreign substrates is investigated using morphological and optical analyses in dependence on the temperature of the substrate and its distance from the nozzle. It is shown that a middle range of substrate distance is required to avoid crystallinity damage by heavy ions while still keeping their effect on grain nucleation. In this case, well shaped crystalline grains embedded with a ‘highly ordered’ amorphous phase are found in Si films grown at a low temperature at the edge of crystalline growth.

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Thin film polycrystalline silicon solar cell on ceramics with a seeding layer formed via aluminium-induced crystallisation of amorphous silicon
Author(s): C. Ornaghi, M. Stöger, G. Beaucarne, J. Poortmans, P. Schattschneider
Source: IEE Proceedings - Circuits, Devices and Systems, Volume 150, Issue 4, 2003 , p. 287 - 292
Type: Article
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Thin film polycrystalline silicon solar cells on foreign substrates are viewed as one of the most promising approaches to cost reduction in photovoltaics. To enhance the quality of the film, the use of ‘seeding layers’ prior to deposition of active material is being investigated. It has been shown that a phenomenon suitable to create such a seeding layer is the aluminium-induced crystallisation of amorphous silicon. Previous work mainly considered glass as the substrate of choice, thereby introducing limitations on the deposition temperature. Results concerning the application of such a technique to ceramic substrates (allowing the use of high-temperature CVD) are described. Also, the first reported results of a solar cell made in silicon deposited on these seeding layers are presented.

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