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Photoelectric conversion; solar cells and arrays

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Air-bridge-type electrodes for high-efficiency photovoltaic cell
Author(s): DaeYoung Kong, Changtaeg Seo, Bonghwan Kim, Chan Seob Cho, Jonghyun Lee
Source: Micro & Nano Letters, Volume 6, Issue 7, 2011 , p. 546 - 548
Type: Article
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Recently, the important issues relating to the photovoltaic cell have featured low cost and high efficiency. To make a low-cost and high-efficiency photovoltaic cell, there are many aspects such as the development of inexpensive wafers, process simplification and improvement of optical and electrical properties. In this study, the two-step texturing method using a microblaster was developed to decrease the reflection of incident lights. Bridge-type electrode structures are suggested to expand the effective surface area and decrease the series resistance of finger electrodes. The authors decided to use 10 µm size powders since the efficiency of the solar cell could rather be reduced by using 50 µm size powders because of their extremely rough surface. And the surface of the wafer after microblaster etching was treated with a chemical etching method using HNA (HF:HNO3:CH3COOH=4:9:7) solution, a dry etching method using reactive ion etching and a oxide etching method.

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Wet/dry etching combined microtextured structures for high-efficiency solar cells
Author(s): Chan Seob Cho, DaeYoung Kong, Bonghwan Kim
Source:
Type: Article
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A solar cell texturing process using a two-step process that includes wet etching and dry etching has been developed. The surface reflectance and fill factor (FF) of the pyramid structure by general wet etching texturing process were 5.834 and 70.597%, respectively; the surface reflectance and FF of the two-step pyramid structure by wet etching and dry etching texturing process were 3.69 and 65.013%; and the surface reflectance and FF of the two-step pyramid structure by rounded pyramid and dry etching texturing process were 4.533 and 70.727%. The process of the two-step pyramid structure is as follows. First, the pyramid structure formed by the wet etching process was etched again with tetramethylammonium hydroxide solution. Then, the crest and the trough of the pyramid structure was fine etched, and rounded pyramid structures with a uniform n+ layer was formed. Secondly, a pyramid structure with a high angle on the rounded pyramid structure was formed by using reactive-ion etching with a metal mesh. The two-step pyramid structure by the wet etching and dry etching texturing process has a lower surface reflectance and higher FF than the pyramid structure formed of the wet etching texturing process. Therefore, the etching process is suitable for producing high-efficiency solar cells.

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