access icon free Influences of Nd doping on preparing Mg2Si semiconductor thin films by thermal evaporation

In this work, the thermal evaporation method was adopted to prepare Nd-doped Mg2Si semiconductor thin films on n-Si(111) substrate. The structure, morphology and optical properties of these Mg2Si thin films doped with Nd were studied by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and Raman spectroscopy (RAMAN). The XRD results showed that Nd dopant led to weakened Mg2Si diffraction peaks and bigger lattice constants. The scanning electron microscopy results indicated decreased size of Mg2Si grains and clusters formed by the grains because of Nd dopant. The RAMAN results showed that the intensity of the characteristic peaks near 256 and 690 cm−1 decreased due to the influence of Nd doping.

Inspec keywords: semiconductor growth; lattice constants; surface morphology; vacuum deposition; neodymium; Raman spectra; semiconductor thin films; grain size; semiconductor materials; semiconductor doping; X-ray diffraction; field emission scanning electron microscopy; magnesium compounds

Other keywords: semiconductor thin films; n-Si(111) substrate; Nd dopant; diffraction peaks; grain size; Mg2Si:Nd; Si; Raman spectroscopy; surface morphology; field emission scanning electron microscopy; Nd doping; thermal evaporation method; optical properties; X-ray diffraction; lattice constants; structural properties

Subjects: Optical properties of other inorganic semiconductors and insulators (thin films, low-dimensional and nanoscale structures); Vacuum deposition; Infrared and Raman spectra in inorganic crystals; Thin film growth, structure, and epitaxy; Semiconductor doping; Vacuum deposition; Solid surface structure; Microstructure; Doping and implantation of impurities; Other semiconductor materials

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