access icon free Investigation of RF and linearity performance of electrode work-function engineered HDB vertical TFET

This work realises a hetero-dielectric buried oxide vertical tunnel field effect transistor (HDB VTFET) and investigates its radio frequency (RF) and linearity characteristics. First time, the concept of hetero-dielectric buried oxide (BOX) in VTFET is used to obtain the superior improvement in terms of different RF and linearity figure of merits such as , , , , Gain Bandwidth Product (GBP), , Transconductance Frequency Product (TFP), Transconductance Generation Factor (TGF), , , , , , and 1-dB compression point. Also, the influence of HfO2 BOX length scaling on these FOMs is analysed. The results reveal that the HDB VTFET can be a promising contender to replace bulk metal-oxide semiconductor field-effect transistors in analogue/mixed signal system-on-chip and high-frequency microwave applications and the accuracy of this device is validated by TCAD Sentaurus simulator.

Inspec keywords: technology CAD (electronics); silicon-on-insulator; field effect transistors; tunnel transistors; work function; elemental semiconductors; semiconductor device models

Other keywords: HDB vertical TFET; TCAD Sentaurus simulator; HfO2; hetero-dielectric buried oxide vertical tunnel field effect transistor; bulk metal-oxide semiconductor field-effect transistors; HDB VTFET

Subjects: Semiconductor device modelling, equivalent circuits, design and testing; Insulated gate field effect transistors; Other field effect devices

http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2018.5307
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