access icon free Wafer-level fabrication of low power consumption integrated alcohol microsensor

An integrated alcohol microgas sensor was designed and fabricated based on TiO2/SnO2 nanocomposites acting as a sensing layer and microheater providing working temperature. The stacked TiO2/SnO2 nanocomposites were prepared by magnetron sputtering. A unique suspended membrane consisting of Si3N4/SiO2/Si3N4/SiO2 four layers was prepared by different methods, respectively, and applied in microheater to support the electrodes and sensing layer for reducing power consumption. The fabrication process tackled the difficulty that the sensing layer preparation is incompatible with microelectromechanical systems micromachining technology and realised the mass production of the wafer-level sensor chips with good consistency. The microalcohol sensors showed excellent response characteristics for alcohol (50–600 ppm) detection at low power consumption (39 mW).

Inspec keywords: titanium compounds; organic compounds; microsensors; nanosensors; power consumption; electrochemical electrodes; tin compounds; gas sensors; sputter deposition; temperature measurement; power measurement; suspensions; nanocomposites; micromachining; membranes; temperature sensors

Other keywords: alcohol detection; microelectromechanical systems micromachining technology; wafer-level sensor chips; nanocomposites; power 39.0 mW; suspended membrane; magnetron sputtering; electrodes; microheater; low power consumption integrated alcohol microgas sensor; wafer-level fabrication; TiO2-SnO2

Subjects: Chemical sensors; Thermal variables measurement; Thermometry; Emulsions and suspensions; Power and energy measurement; Micromechanical and nanomechanical devices and systems; Electrochemistry and electrophoresis; Microsensors and nanosensors; Fabrication of MEMS and NEMS devices; Design and modelling of MEMS and NEMS devices; Biological transport; cellular and subcellular transmembrane physics; Chemical variables measurement; Chemical sensors; Sputter deposition; Deposition by sputtering

http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2018.5183
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content/journals/10.1049/mnl.2018.5183
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