access icon free Facile and low-cost fabrication of uniform silicon micro/nanostructures by nanopitting-assisted wet chemical etching

Silicon micro/nanostructures are promising building blocks for high-performance solar cells, lithium-ion batteries, sensors and so on. Great challenges like high cost and complex fabrication process still exist for the fabrication of silicon micro/nanostructures, especially for the fabrication of uniformly distributed silicon micro/nanostructures. In this study, the generally unwelcome failure of materials, nanopitting, was introduced and demonstrated to be effective in micro/nanofabrication for the first time. Together with wet chemical etching, uniformly distributed silicon micro/nanostructures were obtained. Ag islands were formed by the nanopitting of chloridion, which will be used as mask and catalyser in the chemical etching process. The silicon micro/nanostructures, especially, uniformly distributed p-type silicon micro/nanostructures were fabricated with the low-cost and facile fabrication approach. In addition, the application of the silicon micro/nanostructures was demonstrated as microsupercapacitive electrodes with the integration of MnO2 nanostructures. The results show that the electrochemical performance of silicon micro/nanostructures was much better than that of silicon microstructures. The proposed approach is cost-effective to fabricate silicon micro/nanostructures, and the silicon micro/nanostructures have great potentials in miniaturised energy storage devices, sensors and photodevices.

Inspec keywords: nanofabrication; manganese compounds; silicon; electrochemical electrodes; nanostructured materials; silver; supercapacitors; etching; elemental semiconductors

Other keywords: Ag; silicon microstructures; catalyser; mask; chemical etching process; microfabrication; nanopitting-assisted wet chemical etching; photodevices; MnO2; lithium-ion batteries; miniaturised energy storage devices; nanofabrication; microsupercapacitive electrodes; complex fabrication process; chloridion nanopitting; Si; sensors; low-cost fabrication; facile fabrication approach; uniformly distributed silicon p-type silicon nanostructures; uniformly distributed p-type silicon microstructures; high-performance solar cells

Subjects: Methods of nanofabrication and processing; Surface treatment (semiconductor technology); Nanometre-scale semiconductor fabrication technology; Electronic structure of elemental semiconductors (thin films, low dimensional and nanoscale structures); Surface treatment and degradation in semiconductor technology; Electrochemistry and electrophoresis; Elemental semiconductors; Microstructure

References

    1. 1)
    2. 2)
    3. 3)
    4. 4)
    5. 5)
    6. 6)
    7. 7)
    8. 8)
    9. 9)
    10. 10)
    11. 11)
    12. 12)
    13. 13)
    14. 14)
    15. 15)
    16. 16)
    17. 17)
    18. 18)
    19. 19)
    20. 20)
    21. 21)
    22. 22)
    23. 23)
    24. 24)
    25. 25)
    26. 26)
    27. 27)
    28. 28)
    29. 29)
    30. 30)
    31. 31)
    32. 32)
    33. 33)
    34. 34)
    35. 35)
    36. 36)
    37. 37)
    38. 38)
    39. 39)
      • 27. Dou, B., Jia, R., Li, H., et al: ‘Maskless fabrication of selectively sized silicon nanostructures for solar cell application’, J. Vac. Sci. Technol. B, 2013, 24, p. 225305.
    40. 40)
    41. 41)
    42. 42)
http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2018.0185
Loading

Related content

content/journals/10.1049/mnl.2018.0185
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading