access icon free Preparation of γ-alumina/silica core–shell abrasives and their chemical mechanical polishing performances on sapphire substrates

The chemical mechanical polishing (CMP) process has become a widely accepted global planarisation technology. The abrasive is one of the important influencing factors during the CMP process. In this work, γ-alumina/silica abrasives with a core–shell structure were synthesised. Time-of-flight secondary ion mass spectroscopy was used to characterise the composition of the obtained abrasives. The morphology and structure of the abrasives were measured by using scanning electron microscopy and transmission electron microscopy. The CMP performances of the γ-alumina/silica abrasives on sapphire substrates were investigated. Experimental results indicate that the γ-alumina/silica abrasives exhibit lower surface roughness and higher material removal rate than that of pure silica and γ-alumina abrasives under the same testing conditions. Furthermore, through the X-ray photoelectron spectroscopy test, this work investigated the chemical effect mechanism of the γ-alumina/silica core–shell abrasives in sapphire CMP. The results show that solid-state chemical reactions occur between the silica shell and sapphire surface during the CMP process. The study also established a wear model to investigate the mechanical friction mechanism.

Inspec keywords: sapphire; X-ray photoelectron spectra; surface roughness; abrasives; materials preparation; scanning electron microscopy; friction; secondary ion mass spectra; alumina; composite materials; time of flight mass spectra; transmission electron microscopy; surface morphology; chemical mechanical polishing; abrasion; silicon compounds

Other keywords: sapphire substrates; Al2O3; chemical effect; wear model; morphological properties; core–shell structure; γ-alumina-silica core-shell abrasives; scanning electron microscopy; chemical mechanical polishing; time-of-flight secondary ion mass spectroscopy; Al2O3-SiO2; global planarisation technology; solid-state chemical reactions; mechanical friction; surface roughness; X-ray photoelectron spectroscopy; transmission electron microscopy

Subjects: Electron spectroscopy for chemical analysis (photoelectron, Auger spectroscopy, etc.); Mass spectrometry (chemical analysis); Photoelectron spectra of composite surfaces; Atom-, molecule-, and ion-surface impact and interactions; Solid surface structure; Tribology; Friction, lubrication, and wear; Corrosion, oxidation, etching, and other surface treatments; Other methods of preparation of materials

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http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2018.0166
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