http://iet.metastore.ingenta.com
1887

Nanostructured ZnO thin film with improved optical and electrochemical properties prepared by hydrothermal electrochemical deposition technique

Nanostructured ZnO thin film with improved optical and electrochemical properties prepared by hydrothermal electrochemical deposition technique

For access to this article, please select a purchase option:

Buy article PDF
$19.95
(plus tax if applicable)
Buy Knowledge Pack
10 articles for $120.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Micro & Nano Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

Zinc oxide (ZnO) thin films were grown on fluorine-doped tin oxide coated glass substrate by the hydrothermal electrochemical deposition (HTED) route using slightly acidic aqueous zinc acetate solution at 80°C and were characterised by various techniques. The deposited films showed n-type behaviour with improved carrier concentration. The steady state photocurrent densities were found to be 0.4 mA/cm2 (under UV irradiation) and 8 µA/cm2 (under visible light illumination) at zero bias potential. Significant improvement of optical, electrochemical and photoelectrochemical properties of deposited films could be achieved using HTED technique.

Inspec keywords: nanofabrication; electrodeposition; ultraviolet spectra; wide band gap semiconductors; semiconductor growth; photoconductivity; zinc compounds; nanostructured materials; carrier density; II-VI semiconductors; visible spectra; current density; photoelectrochemistry; semiconductor thin films

Other keywords: fluorine-doped tin oxide coated glass substrate; n-type behaviour; photoelectrochemical properties; optical properties; nanostructured zinc oxide thin films; hydrothermal electrochemical deposition technique; SnO2:F-SiO2; HTED technique; ZnO; visible light illumination; carrier concentration; UV irradiation; electrochemical properties; acidic aqueous zinc acetate solution; zero bias potential; steady state photocurrent density; temperature 80 degC

Subjects: Electrical properties of II-VI and III-V semiconductors (thin films/low-dimensional structures); Low-dimensional structures: growth, structure and nonelectronic properties; Deposition from liquid phases (melts and solutions); Optical properties of II-VI and III-V semiconductors (thin films/low-dimensional structures); Thin film growth, structure, and epitaxy; Electrochemistry and electrophoresis; Photoconduction and photovoltaic effects; photodielectric effects; Visible and ultraviolet spectra of II-VI and III-V semiconductors; Structure of solid clusters, nanoparticles, nanotubes and nanostructured materials; Deposition from liquid phases; Photochemistry and radiation chemistry; Nanometre-scale semiconductor fabrication technology; Photoconducting materials and properties; II-VI and III-V semiconductors

http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2015.0528
Loading

Related content

content/journals/10.1049/mnl.2015.0528
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading
This is a required field
Please enter a valid email address