http://iet.metastore.ingenta.com
1887

Wet/dry etching combined microtextured structures for high-efficiency solar cells

Wet/dry etching combined microtextured structures for high-efficiency solar cells

For access to this article, please select a purchase option:

Buy article PDF
$19.95
(plus tax if applicable)
Buy Knowledge Pack
10 articles for $120.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Micro & Nano Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

A solar cell texturing process using a two-step process that includes wet etching and dry etching has been developed. The surface reflectance and fill factor (FF) of the pyramid structure by general wet etching texturing process were 5.834 and 70.597%, respectively; the surface reflectance and FF of the two-step pyramid structure by wet etching and dry etching texturing process were 3.69 and 65.013%; and the surface reflectance and FF of the two-step pyramid structure by rounded pyramid and dry etching texturing process were 4.533 and 70.727%. The process of the two-step pyramid structure is as follows. First, the pyramid structure formed by the wet etching process was etched again with tetramethylammonium hydroxide solution. Then, the crest and the trough of the pyramid structure was fine etched, and rounded pyramid structures with a uniform n+ layer was formed. Secondly, a pyramid structure with a high angle on the rounded pyramid structure was formed by using reactive-ion etching with a metal mesh. The two-step pyramid structure by the wet etching and dry etching texturing process has a lower surface reflectance and higher FF than the pyramid structure formed of the wet etching texturing process. Therefore, the etching process is suitable for producing high-efficiency solar cells.

References

    1. 1)
    2. 2)
    3. 3)
    4. 4)
    5. 5)
      • 5. Manea, E., Budianu, E., Purica, M., et al: ‘Silicon solar cells parameters optimization by adequate surface processing techniques’, Rom. J. Inf. Sci. Tech., 2008, 11, (4), pp. 337345.
    6. 6)
    7. 7)
      • 7. Dekkers, H.F.W., Duerinckx, F., Szlufcik, J., et al: ‘Silicon surface texturing by reactive ion etching’, OPTO – Electron. Rev., 2000, 8, pp. 311316.
    8. 8)
    9. 9)
    10. 10)
    11. 11)
      • 11. Blakers, A.W., Green, M.A.: ‘20% efficiency silicon solar cells’, J. Appl. Phys., 1986, 48 (3), pp. 215217.
    12. 12)
    13. 13)
    14. 14)
    15. 15)
http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2015.0182
Loading

Related content

content/journals/10.1049/mnl.2015.0182
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading
This is a required field
Please enter a valid email address