access icon free Deposition of platinum nanoparticles on p-type macroporous silicon wall

A novel thermochemical technique of depositing platinum nanoparticles (PtNPs) on a porous silicon (PS) substrate is demonstrated. Self-arranged macroporous structures, appearing as microtest tubes, are first formed on p-type, boron doped, 100 orientation silicon wafers, by the electrochemical etching method in hydrofluoric acid and N, N-dimethyl formamide solution. The macroPS substrate is then coated with PtNPs by a novel thermochemical procedure. It was observed that PtNPs deposited on the pore walls are able to arrive even at the bottom of the pores without blocking their openings. Such PtNPs-coated macroPS chips have potential biomedical applications as silicon and platinum are biocompatible.

Inspec keywords: self-assembly; boron; elemental semiconductors; porous materials; thermochemistry; nanoparticles; crystal growth from solution; platinum; etching

Other keywords: thermochemical technique; 100 orientation silicon wafers; self-arranged macroporous structures; p-type silicon wafers; porous silicon substrate; biocompatible materials; boron doped silicon wafers; electrochemical etching method; biomedical applications; platinum nanoparticle deposition; pore walls; Si; Pt−Si; microtest tubes; N,N-dimethyl formamide solution; p-type macroporous silicon wall; hydrofluoric acid; macroPS chips

Subjects: Monolayers and Langmuir-Blodgett films; Structure of solid clusters, nanoparticles, nanotubes and nanostructured materials; Surface treatment and degradation in semiconductor technology; Methods of nanofabrication and processing; Structure of powders and porous materials

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