Synthesis and field-emission properties of oriented GaN nanowires

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Synthesis and field-emission properties of oriented GaN nanowires

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Oriented gallium nitride (GaN) nanowires grown on Pt-coated Si (1 1 1) substrates, were synthesised using the chemical vapour deposition method under different Ga sources. The characteristics of the grown GaN nanowires were investigated using scanning electron microscopy and X-ray diffraction, which found that the as-synthesised GaN nanowires of the three samples are of different orientation, and all displayed hexagonal wurtzite structures of GaN crystals. The electron field-emission properties of the three samples of GaN nanowires showed a low turn-on field of 4.5, 5.5 and 6.2 V/µm, respectively, and field enhancement factors of 1337, 2948 and 2599, respectively.

Inspec keywords: scanning electron microscopy; X-ray diffraction; field emission; III-V semiconductors; nanowires; wide band gap semiconductors; nanofabrication; chemical vapour deposition; gallium compounds

Other keywords: field enhancement factor; turn-on field; hexagonal wurtzite structures; Pt-Si; field emission properties; electron field-emission properties; GaN; oriented GaN nanowires; Pt-coated Si (111) substrates; GaN crystals; scanning electron microscopy; Ga sources; X-ray diffraction; chemical vapour deposition

Subjects: Chemical vapour deposition; Structure of solid clusters, nanoparticles, nanotubes and nanostructured materials; Methods of nanofabrication and processing; Field emission and field ionization; Nanometre-scale semiconductor fabrication technology; Chemical vapour deposition; II-VI and III-V semiconductors

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