Fabrication of nano-mechanical switch using focused ion beam for complex nano-electronic circuits

Access Full Text

Fabrication of nano-mechanical switch using focused ion beam for complex nano-electronic circuits

For access to this article, please select a purchase option:

Buy article PDF
£12.50
(plus tax if applicable)
Add to cart
Buy Knowledge Pack
10 articles for £75.00
(plus taxes if applicable)
Add to cart

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Micro & Nano Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

© The Institution of Engineering and Technology
Published

A nano-mechanical switch has been fabricated and its switching action has been demonstrated. The device utilises the phenomenon of bending of Pt nanopillars and cantilevers induced by focused ion beam (FIB). Two skew Pt pillars with equal lengths and different cross-sections have been fabricated subtending an angle of approximately 100° with each other using FIB-chemical vapour deposition (CVD). One of the pillars is initially made to bend towards the adjacent pillar to achieve a physical contact with it, and then is bent in opposite direction from it. The pillar has been bent along the desired orientation by appropriately choosing the ion beam irradiation directions. The switching action has been demonstrated by applying constant voltage across the Pt pillars and measuring the current passing through it, as a function of time during ion beam scanning. These nano-mechanical switches would find useful applications during the in-situ electrical characterisation of micro- and nano-structures fabricated by FIB.

Inspec keywords: chemical vapour deposition; nanoelectronics; platinum; focused ion beam technology; nanofabrication; bending; cantilevers; nanoelectromechanical devices; switches

Other keywords: complex nanoelectronic circuits; nanomechanical switch; nanopillars; FIB-chemical vapour deposition; bending; Pt; cantilevers; focused ion beam

Subjects: Micromechanical and nanomechanical devices and systems; Fabrication of MEMS and NEMS devices; Relays and switches; Chemical vapour deposition

References

    1. 1)
      • S.K. Tripathi , N. Shukla , N.S. Rajput , V.N. Kulkarni . The out of beam sight effects in focused ion beam processing. Nanotechnology , 27
    2. 2)
      • R.M. Langford , T.X. Wang , D. Ozkaya . Reducing the resistivity of electron and ion beam assisted deposited Pt. Microelectron. Eng. , 748 - 788
    3. 3)
      • J. Orloff , M. Utlaut , L. Swanson . (2003) High resolution focused ion beams: FIB and its applications.
    4. 4)
      • R.L. Badzey , G. Zolfagharkhani , A. Gaidarzhy , P. Mohanty . Temperature dependence of a nanomechanical switch. Appl. Phys. Lett.
    5. 5)
    6. 6)
      • S. Reyntjens , R. Puers . A review of focused ion beam applications in microsystem technology. J. Micromech. Microeng. , 287 - 300
    7. 7)
      • S. Matsui . Focused-ion-beam deposition for 3-D nanostructure fabrication. Nucl. Instrum. Meth. B , 758 - 764
    8. 8)
      • S.E. Wu , C.P. Liu , T.H. Hsueh , H.C. Chung , C.C. Wang , C.V. Wang . Anomalous formation of InGaN/GaN multiple-quantum-well nanopillar arrays by focused ion beam milling. Nanotechnology
    9. 9)
      • S.K. Tripathi , N. Shukla , V.N. Kulkarni . Substrate atom enriched carbon nanostructures fabricated by focused electron beam induced deposition. Nanotechnology
    10. 10)
      • A.A. Tseng . Recent developments in micromilling using focused ion beam technology. J. Micromech. Microeng. , R15 - R34
    11. 11)
      • N. Shukla , S.K. Tripathi , M. Sarkar , N.S. Rajput , V.N. Kulkarni . Micro and nano patterning by focused ion beam enhanced adhesion. Nucl. Instrum. Meth. B , 1376 - 1380
    12. 12)
      • V. Callegaria , P.M. Nellen , J. Kaufmann , P. Strasser , F. Robin , U. Sennhauser . Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals. J. Vac. Sci. Technol. B , 2175 - 2179
    13. 13)
      • S.K. Tripathi , N. Shukla , V.N. Kulkarni . Correlation between ion beam parameters and physical characteristics of nanostructures fabricated by focused ion beam. Nucl. Instrum. Meth. B , 1468 - 1474
    14. 14)
      • G.B. Assayag , J. Gierak , J.F. Hamet . In situ processing of high-Tc YBaCuO superconducting devices by focused ion beam micromachining at low temperature. J. Vac. Sci. Technol. B , 2772 - 2776
    15. 15)
      • S.E. Wu , C.P. Liu . Direct writing of Si island arrays by focused ion beam milling. Nanotechnology , 2507 - 2511
    16. 16)
      • N. Mounet , N. Marzari . First-principles determination of the structural, vibrational and thermodynamic properties of diamond, graphite, and derivatives. Phys. Rev. B
    17. 17)
    18. 18)
      • F.P. Stratton , R.L. Kubena , H.H. McNulty , R.J. Joyce , J. Vajo . Microelectromechanical tunneling sensor fabrication and post-processing characterization using focused ion beams. J. Vac. Sci. Technol. B , 2449 - 2454
    19. 19)
      • R. Kometani , T. Morita , K. Watanabeb . Nanomanipulator and actuator fabrication on glass capillary by focused-ion-beam-chemical vapor deposition. J. Vac. Sci. Technol. B , 257 - 263
    20. 20)
      • S. Khizroev , Y. Hijazi , R. Chomko . Focused ion beam fabricated nanoscale magnetoresistive ballistic sensors. Appl. Phys. Lett.
    21. 21)
    22. 22)
      • J. Wu , M. Eastman , T. Gutu . Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition. Appl. Phys. Lett.
    23. 23)
      • S.K. Tripathi , N. Shukla , S. Dhamodaran , V.N. Kulkarni . Controlled manipulation of carbon nano pillars and cantilevers by focused ion beam. Nanotechnology
    24. 24)
      • M. Jung , W. Song , J.S. Lee . Electrical breakdown and nanogap formation of indium oxide core/shell heterostructure nanowires. Nanotechnology
    25. 25)
      • S.K. Tripathi , N. Shukla , V.N. Kulkarni . Exploring a new strategy for nano fabrication: deposition by scattered Ga ions using focused ion beam. Nanotechnology
http://iet.metastore.ingenta.com/content/journals/10.1049/mnl.2010.0015
Loading

Related content

content/journals/10.1049/mnl.2010.0015
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading