GaInNAs metal-semiconductor-metal near-infrared photodetectors

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GaInNAs metal-semiconductor-metal near-infrared photodetectors

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Fabrication of metal–semiconductor–metal near-infrared photodetectors with 0.4 µm-thick GaInNAs absorption layer was demonstrated. Better crystal quality and fewer dislocations were obtained from samples with lower nitrogen content based on the results of photoluminescence and high-resolution X-ray diffraction. The absorption edge located at 1.2 µm under 4 V bias was realised owing to the nitrogen incorporation effect, and the responsivity of GaInNAs MSM photodetectors higher than 60 mA/w was also successfully achieved when compared to other conventional InGaAs detectors. The devices, hereby demonstrated believably, should have potential applications in fibre optics communications.

Inspec keywords: metal-semiconductor-metal structures; optical fabrication; X-ray diffraction; gallium compounds; wide band gap semiconductors; dislocations; semiconductor doping; photoluminescence; III-V semiconductors; photodetectors; infrared detectors; gallium arsenide

Other keywords: photoluminescence; 1.2 mum; absorption edge; GaInNAs; 4 V; metal-semiconductor-metal near-infrared photodetectors; 0.4 mum; nitrogen incorporation effect; X-ray diffraction; GaInNAs absorption layer; dislocations

Subjects: Doping and implantation of impurities; Etch pits, decoration, transmission electron-microscopy and other direct observations of dislocations; Photodetectors; Semiconductor doping; Impurity concentration, distribution, and gradients; Detection of radiation (bolometers, photoelectric cells, i.r. and submillimetre waves detection); Metal-insulator-metal and metal-semiconductor-metal structures

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