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Thin film polycrystalline silicon solar cell on ceramics with a seeding layer formed via aluminium-induced crystallisation of amorphous silicon

Thin film polycrystalline silicon solar cell on ceramics with a seeding layer formed via aluminium-induced crystallisation of amorphous silicon

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Thin film polycrystalline silicon solar cells on foreign substrates are viewed as one of the most promising approaches to cost reduction in photovoltaics. To enhance the quality of the film, the use of ‘seeding layers’ prior to deposition of active material is being investigated. It has been shown that a phenomenon suitable to create such a seeding layer is the aluminium-induced crystallisation of amorphous silicon. Previous work mainly considered glass as the substrate of choice, thereby introducing limitations on the deposition temperature. Results concerning the application of such a technique to ceramic substrates (allowing the use of high-temperature CVD) are described. Also, the first reported results of a solar cell made in silicon deposited on these seeding layers are presented.

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