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Large-area shower implanter for thin-film transistors

Large-area shower implanter for thin-film transistors

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Solid-state diffusion and conventional ion implantation are not suitable for source and drain regions formation of polysilicon thin-film transistors on glass substrates. A 30 cm diameter large-area low-energy ion shower implanter with RIPE ion source and double-grid extraction system was developed as a possible low-cost solution. The ion beam current density for hydrogen plasma was 100 µA/cm2 for 3 keV implant energy, 300 W RF power, 140 gauss magnetic field and 3*10-4 mbar pressure. The uniformity of beam current density over the central 20 cm diameter was ±3.5%. Phosphorus implantation has been performed using a 15% PH3 in H2 gas mixture. Implantation at 3 keV for 5 min. results in an integrated dose of 2.48*1016 cm-2 with the concentration peak at a depth of 8.3 nm. Planar and mesa diodes fabricated on p-type silicon substrates have yielded fine rectifier characteristics. The shower implanter is thus suitable for TFTs source and drain region formation.

http://iet.metastore.ingenta.com/content/journals/10.1049/ip-cds_19949826
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