access icon free High coupling efficiency 2D metasurface integrated with strip waveguide in SOI for mid-IR wavelengths

© The Institution of Engineering and Technology
Received 20/11/2018, Accepted 31/05/2019, Revised 23/04/2019, Published 03/06/2019

Two-dimensional (2D) metasurface integrated with strip waveguide in silicon-on-insulator (SOI) has been designed to achieve high coupling efficiency for 3.8 μm wavelength. The optimisation in period and radius has been achieved using 3D finite-difference time-domain (FDTD). The calculated coupling efficiency in the in-plane waveguide for the out-of-plane surface illumination is over 90% with a bandwidth of 1 μm. The design is consistent with the available lithography using 400 nm thick SOI for mid-IR applications. Finally, monolithic integration can be achieved using standard multi-project wafer run.

Inspec keywords: finite difference time-domain analysis; optical couplers; elemental semiconductors; optical fabrication; integrated optoelectronics; light propagation; optical arrays; optical waveguides; silicon-on-insulator; optical dispersion; silicon; integrated optics

Other keywords: Si; out-of-plane surface illumination; tandard multiproject wafer run; mid-IR wavelengths; calculated coupling efficiency; SOI; in-plane waveguide; size 400.0 nm; size 1.0 mum; monolithic integration; silicon-on-insulator; mid-IR applications; strip waveguide; high coupling efficiency; 3D FDTD; wavelength 3.8 mum

Subjects: Optical materials; Integrated optics; Optical waveguides; Optical fabrication, surface grinding; Optical waveguides and couplers; Integrated optoelectronics; Optical propagation, transmission and absorption; Integrated optics; Fibre couplers and connectors; Numerical approximation and analysis; Light propagation

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