access icon openaccess Polymer-assisted deposition of perovskite dielectric oxide thin films

Perovskite dielectric oxide thin films are tremendously important because of their promising applications in microelectronics and optic-electronic devices. Towards scalable applications of these materials, the development of well-controlled and cost-effective fabrication techniques is still under development. Here, recent progresses in the fabrication of perovskite dielectric oxide thin films by using a generic chemical solution deposition technique named polymer-assisted deposition (PAD) are reviewed. In this technique, metal ions are bonded to water-soluble polymers, forming stable and homogeneous precursor solutions of metallic ions surrounded by polymers which prevent hydrolysis of metal ions. Fabrication of the perovskite dielectric oxide thin films using the PAD technique, both on single crystal substrates and base metallic substrates, has been realised with good controllability. The qualities of the films are comparable with those of the ones prepared by physical-vapour deposition techniques.

Inspec keywords: liquid phase deposition; thin films; polymers; dielectric thin films; barium compounds

Other keywords: perovskite dielectric oxide thin films; homogeneous precursor solutions; physical-vapour deposition; chemical solution deposition; hydrolysis; polymer-assisted deposition; metallic ions; perovskite dielectric oxide; water-soluble polymers; crystal substrates

Subjects: Thin film growth, structure, and epitaxy; Deposition from liquid phases (melts and solutions); Solubility, segregation, and mixing; Dielectric thin films

http://iet.metastore.ingenta.com/content/journals/10.1049/iet-nde.2017.0008
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content/journals/10.1049/iet-nde.2017.0008
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