Silicon-on-insulator for high-temperature applications
The silicon-on-insulator (SOI) CMOS technology is one of the best candidates for high-temperature applications due to its low leakage current, steep subthreshold slope, absence of latch-up phenomenon and temperature‐resistant threshold voltage. However, the most critical elements for high temperature applications are transmission lines, especially thin-film microstrip lines. In the paper, the impact of high-temperature operation on the RF performance of some SOI circuits is analysed up to 250°C.