Single and double-gate based AlGaN/GaN MOS-HEMTs for the design of low-noise amplifiers: a comparative study
- Author(s): Deepak Kumar Panda 1 ; Rajan Singh 2 ; Trupti Ranjan Lenka 2 ; Thi Tan Pham 3 ; Ravi Teja Velpula 4 ; Barsha Jain 4 ; Ha Quoc Thang Bui 4 ; Hieu Pham Trung Nguyen 4
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View affiliations
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Affiliations:
1:
School of Electronics, VIT-AP University , Amaravati, AP 522237 , India ;
2: Microelectronics and VLSI Design Group, Department of Electronics & Communication Engineering , National Institute of Technology Silchar , Cachar, Assam 788010 , India ;
3: Ho Chi Minh City University of Technology, Vietnam National University Ho Chi Minh City , 268 Ly Thuong Kiet, Ward 14, District 10, Ho Chi Minh City, 700000 , Vietnam ;
4: Department of Electrical and Computer Engineering , New Jersey Institute of Technology , Newark, NJ 07102 , USA
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Affiliations:
1:
School of Electronics, VIT-AP University , Amaravati, AP 522237 , India ;
- Source:
Volume 14, Issue 7,
October
2020,
p.
1018 – 1025
DOI: 10.1049/iet-cds.2020.0015 , Print ISSN 1751-858X, Online ISSN 1751-8598
In this study, a 60 nm gate length double-gate AlGaN/GaN/AlGaN metal-oxide-semiconductor high-electron-mobility transistor (MOS-HEMT) is proposed and different electrical characteristics, such as DC, small-signal, radio-frequency (RF) and high-frequency noise performances of the devices are characterised through TCAD device simulations. The results of double-gate MOS-HEMT are compared with the TCAD simulation results as well as with available experimental data of single-gate AlGaN/GaN MOS-HEMT having a similar gate length available from the literature. It is observed that the double-gate AlGaN/GaN/AlGaN MOS-HEMT shows good sub-threshold slope, improved ON current, short-channel effect immunity, improved RF and noise performance. A look-up table-based Verilog-A model is developed for both devices and the models are incorporated into the Cadence EDA tool to utilise the proposed device in circuit simulations. The Verilog-A model is applied to design a 1–20 GHz wideband feedback cascode low-noise amplifier (LNA). Performance variability of LNA due to single- and double-gate MOS-HEMT is also investigated.
Inspec keywords: semiconductor device models; microwave amplifiers; high electron mobility transistors; aluminium compounds; microwave field effect transistors; gallium compounds; technology CAD (electronics); hardware description languages; low noise amplifiers; III-V semiconductors; wide band gap semiconductors; table lookup
Other keywords: Cadence EDA tool; double-gate MOS-HEMT; single-gate MOS-HEMT; circuit simulations; TCAD device simulations; RF performance; wideband feedback cascode; AlGaN-GaN-AlGaN; performance variability; short-channel effect immunity; low-noise amplifier; metal-oxide-semiconductor high-electron-mobility transistor; electrical characteristics; look-up table; frequency 1.0 GHz to 20.0 GHz; sub-threshold slope; LNA; size 60.0 nm; noise performance; high-frequency noise performances; Verilog-A model
Subjects: Semiconductor device modelling, equivalent circuits, design and testing; Amplifiers; Solid-state microwave circuits and devices; Other field effect devices
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