access icon free Design of a novel structure capacitive RF MEMS switch to improve performance parameters

This study reports the design and analysis of novel step structure RF micro-electromechanical system (MEMS) switch for low pull-in voltage, low insertion loss and high isolation by using uniform single meander. The central beam of the membrane is designed with 0.5 µm lower than the side beams to form a step-down structure which reduces the pull-in voltage. Stress analysis, electromechancial, switching time, quality factor and RF analysis have done to understand the behavioural characteristics of the proposed step-down switch. The analysis has been carried out for different beam and dielectric materials among them switch with gold material exhibits low pull-in voltage of 4.7 V, low insertion loss <1 dB and high isolation of −38.3 dB at 28.2 GHz for silicon nitride. The switch also shows good quality factor of 0.95 for gold material along with high capacitance ratio of 132. The upstate capacitance of 56.8 pF contributes low return loss and made the switch to transmit the signal up to 26.2 GHz and provides 7.2 pF of downstate capacitance to produce high isolation at 26.2 GHz which is efficiently used for K-band satellite applications.

Inspec keywords: radiofrequency integrated circuits; microwave switches; dielectric materials; microswitches; Q-factor; silicon compounds; gold

Other keywords: capacitive RF MEMS switch; frequency 28.2 GHz; pull-in voltage; Au; uniform single meander; low insertion loss; gold material; downstate capacitance; quality factor; Si3N4; RF analysis; low return loss; RF microelectromechanical system; stress analysis; upstate capacitance; high capacitance ratio; capacitance 56.8 pF; step-down structure; dielectric materials; central beam; capacitance 7.2 pF; silicon nitride; K-band satellite applications

Subjects: Microwave integrated circuits; Design and modelling of MEMS and NEMS devices; Relays and switches

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