p-type conduction above room temperature in nitrogen-doped ZnO thin film grown by plasma-assisted pulsed laser deposition

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p-type conduction above room temperature in nitrogen-doped ZnO thin film grown by plasma-assisted pulsed laser deposition

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Nitrogen-doped ZnO thin films were deposited using the pulsed laser deposition technique. The epitaxial ZnO films were p-type in the measured temperature range 200–450 K, with hole concentrations and mobilities of 9.6×1015 cm−3 and 10.8 cm2/V-s, respectively, at room temperature. The films remained p-type under conditions of changing illumination. This result represents a step towards realisation of ZnO-based optoelectronic devices for high-temperature operation.

Inspec keywords: hole density; plasma deposition; semiconductor epitaxial layers; semiconductor growth; wide band gap semiconductors; hole mobility; nitrogen; semiconductor doping; zinc compounds; pulsed laser deposition; II-VI semiconductors

Other keywords: optoelectronic devices; ZnO:N; p-type conduction; epitaxial thin films; plasma-assisted pulsed laser deposition; hole concentrations; hole mobilities; 200 to 450 K

Subjects: Semiconductor doping; II-VI and III-V semiconductors; Electrical properties of II-VI and III-V semiconductors (thin films, low-dimensional and nanoscale structures); Pulsed laser deposition; Oxide and ferrite semiconductors; Plasma applications in manufacturing and materials processing; Thin film growth, structure, and epitaxy; Pulsed laser deposition

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