Room-temperature self-annealing of heavy-ion-irradiated InGaAs/GaAs quantum wells

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Room-temperature self-annealing of heavy-ion-irradiated InGaAs/GaAs quantum wells

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The long-term stability of defects with the ageing of heavy-ion-irradiated and post-irradiated-annealed InGaAs/GaAs compound semiconductor quantum wells is reported using the time-resolved upconversion technique of luminescence lifetimes. The defects created by Ni+-heavy-ion irradiation are found to be thermally unstable. The ageing tests prove that a substantial amount of defects are removed by self-annealing in about a month of time even at room temperature through a slow diffusion process, resulting in a dynamically stable sample but with a twofold increment in lifetimes. If the sample is annealed upon Ni+ irradiation, the defects are removed immediately, yielding stable and much longer relaxation times independent of the ageing process. These results may be useful in designing devices with an active region as ion-irradiated semiconductor quantum wells.

Inspec keywords: indium compounds; rapid thermal annealing; III-V semiconductors; radiation effects; semiconductor quantum wells; gallium arsenide; ageing; diffusion

Other keywords: semiconductor quantum wells; diffusion process; ageing test; time-resolved upconversion technique; InGaAs/GaAs quantum wells; InGaAs-GaAs; self-annealing; heavy-ion-irradiation

Subjects: Low-dimensional structures: growth, structure and nonelectronic properties; Annealing processes in semiconductor technology; Radiation effects (semiconductor technology); Semiconductor superlattices, quantum wells and related structures; Annealing processes

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