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Improvements of resonance characteristics due to thermal annealing of Bragg reflectors in ZnO-based FBAR devices

Improvements of resonance characteristics due to thermal annealing of Bragg reflectors in ZnO-based FBAR devices

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The effects of thermal annealing of W/SiO2 multilayer Bragg reflectors on the resonance characteristics of ZnO-based film bulk acoustic resonator (FBAR) devices are presented for the first time. The resonance characteristics could be significantly improved due to thermal annealing. FBAR devices with Bragg reflectors annealed at 400°C/30 min show excellent resonance characteristics in terms of return loss and Q-factor.

Inspec keywords: bulk acoustic wave devices; losses; acoustic resonators; acoustic wave reflection; Q-factor; acoustic resonator filters; zinc compounds; tungsten; acoustic resonance; annealing; silicon compounds

Other keywords: thermal annealing; W/SiO2 multilayer Bragg reflectors; return loss; resonance characteristics; duplexers; 30 min; ZnO; filters; W-SiO2; bulk acoustic resonator devices; Q-factor; 400 degC; ZnO-based FBAR devices

Subjects: Acoustic wave devices; Sonic and ultrasonic equipment

References

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      • Pinkett, S.L., Hunt, W.D.: `Temperature characteristics of ZnO-based thin film bulk acoustic wave resonators', Proc. IEEE Ultrasonics Symp., 2001, Atlanta, CA, USA, p. 823–826.
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      • Lakin, K.M., McCarron, K.T., McDonald, J.F.: `Temperature compensated bulk acoustic thin film resonators', Proc. IEEE Ultrasonics Symp., 2000, San Juan, Puerto Rico, p. 855–858.
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      • W.E. Newell . Face-mounted piezoelectric resonators. Proc. IEEE , 575 - 581
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      • Lakin, K.M., McCarron, K.T., Rose, R.E.: `Solidly mounted resonators and filters', Proc. IEEE Ultrasonics Symp., 1995, Seattle, WA, USA, p. 905–908.
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