Your browser does not support JavaScript!
http://iet.metastore.ingenta.com
1887

Micromachined metal thin-film pressure sensor suitable for batch process

Micromachined metal thin-film pressure sensor suitable for batch process

For access to this article, please select a purchase option:

Buy article PDF
£12.50
(plus tax if applicable)
Add to cart
Buy Knowledge Pack
10 articles for £75.00
(plus taxes if applicable)
Add to cart

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Electronics Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

© IEE
Published

Description of the fabrication and characteristics of a micromachined metal thin-film pressure sensor for working at high temperatures is presented. The proposed pressure sensor consists of a Cr thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidised Si membranes with an Al interconnection layer. This sensor has the advantages of high sensitivity, high temperature operation and is suitable for batch process.

Inspec keywords: chromium; microsensors; micromachining; pressure sensors; metallic thin films; sputtered coatings; batch processing (industrial); bridge instruments; high-temperature techniques

Other keywords: thermally oxidised Si membrane; fabrication process; high temperature operation; Al; batch process; Cr thin film; Al interconnection layer; Cr; micromachined metal thin film pressure sensor; sputter deposition; Si; Wheatstone bridge; sensitivity

Subjects: Pressure and vacuum measurement; Fabrication of MEMS and NEMS devices; Sputter deposition; Microsensors and nanosensors; Bridge instruments

References

    1. 1)
      • G.S. Chung . Thin SOI structures for sensing and integrated circuit applications. Sens. Actuators A , 241 - 251
    2. 2)
      • S. Sampath , K.V. Ramanaiah . Behavior of Bi-Sb alloy thin-film as strain gauges. Thin-Solid Films , 199 - 205
    3. 3)
      • V. Mosser , J. Suski , J. Goss . Piezoresistive pressure sensors based on poly-crystalline silicon. Sens. Actuators A , 113 - 132
    4. 4)
      • M. Eickoff , H. Moller , G. Kroetz , J.V. Berg , R. Ziermana . A high temperature pressure sensor prepared by selective deposition of cubic silicon carbide on SOI substrates. Sens. Actuators A , 56 - 59
    5. 5)
      • K. Rajanna , S. Mohan , M.M. Nayak , N. Gunasekaran , A.E. Muthunayagam . Pressure transducer with Au-Ni thin-film strain gauges. IEEE Trans. Electron Devices , 521 - 524
    6. 6)
      • V.M. Stuchebnikov . SOS strain gauge sensors for force and pressure transducers. Sens. Actuators A , 207 - 213
http://iet.metastore.ingenta.com/content/journals/10.1049/el_20020933
Loading

Related content

content/journals/10.1049/el_20020933
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading
Print this page
This is a required field
Please enter a valid email address