Radiation hardening of power MOSFETs using electrical stress

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Radiation hardening of power MOSFETs using electrical stress

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The effects of pre-irradiation gate bias stress on the radiation response of power VDMOSFETs are presented, clearly demonstrating the inapplicability of gate bias stressing as a technique for radiation hardening of power MOSFETs.

Inspec keywords: radiation hardening (electronics); interface states; power MOSFET; carrier mobility

Other keywords: radiation hardening; interface traps; mobility; radiation response; oxide-trapped charge; pre-irradiation gate bias stress; power MOSFETs; gate bias stressing technique; power VDMOSFETs; irradiation-induced threshold voltage shift

Subjects: Radiation effects (semiconductor technology); Power semiconductor devices; Insulated gate field effect transistors

References

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      • K.F. Galloway , R.D. Schrimpf . MOS device degradation due to total dose ionizing radiation in the natural space environment: a review. Microelectron. J. , 67 - 81
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      • N. Stojadinovic , S. Dimitrijev . Instabilities in MOS transistors. Microelectron. Reliab. , 371 - 380
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      • N. Stojadinovic , S. Djoric , S. Golubovic , V. Davidovic . Separation of irradiation induced gate oxide charge and interface traps effects in power VDMOSFETs. Electron. Lett. , 1992 - 1993
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