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Textured and smooth AlN films prepared by Helicon sputtering system

Textured and smooth AlN films prepared by Helicon sputtering system

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Highly-textured AlN films were obtained by using a Helicon sputtering system. This sputtering method was able to sustain the plasma in a gas atmosphere of 10-4 Torr, and, in turn, to improve the surface morphology of the film. The AlN film exhibits an extremely smooth surface with a root mean square roughness of only 3.2 Å.

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