TlInGaAs/InP DH LEDs with small temperature variation in EL peak energy

Access Full Text

TlInGaAs/InP DH LEDs with small temperature variation in EL peak energy

For access to this article, please select a purchase option:

Buy article PDF
£12.50
(plus tax if applicable)
Buy Knowledge Pack
10 articles for £75.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Electronics Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

TlInGaAs/InP double heterostructure light emitting diodes with a Tl composition of 6% operating in the wavelength range of 1.58 µm have been fabricated by gas source molecular beam epitaxy and a very small temperature variation in the electroluminescence peak energy (–0.09 meV/K) observed.

Inspec keywords: light emitting diodes; indium compounds; wavelength division multiplexing; optical communication equipment; thulium compounds; optical fabrication; electroluminescence; molecular beam epitaxial growth; III-V semiconductors; gallium arsenide

Other keywords: very small temperature variation; Tl composition; TlInGaAs/InP DH LEDs; EL peak energy; gas source molecular beam epitaxy; TlInGaAs-InP; TlInGaAs-InP double heterostructure light emitting diodes; 1.58 mum; Tl; electroluminescence peak energy; small temperature variation

Subjects: II-VI and III-V semiconductors; Optical communication devices, equipment and systems; Optical fabrication, surface grinding; Vacuum deposition; Light emitting diodes; Electroluminescence (condensed matter); Vacuum deposition; Multiplexing and switching in optical communication; Optical communication equipment

References

    1. 1)
      • W.S. Pelouch , L.A. Schlie . Ultrafast carrier dynamics and saturable absorption in HgCdTe. Appl. Phys. Lett. , 1389 - 1391
    2. 2)
      • K. Takenaka , H. Asahi , H. Koh , K. Asami , S. Gonda , K. Oe . Growth of TlInGaAs on InP by gas source molecular beam epitaxy. Jpn. J. Appl. Phys. , 1026 - 1028
    3. 3)
      • H. Asahi . Thallium compounds: a promising new class of III-V materials for laserdiodes. Compound Semicond. , 34 - 36
    4. 4)
      • K. Oe , H. Asai . Proposal on a temperature-insensitive wavelength semiconductor laser. IEICE Trans. Electron. , 1751 - 1758
    5. 5)
      • H. Asahi , K. Yamamoto , K. Iwata , S. Gonda , K. Oe . New III-V compound semiconductors TlInGaP for 0.9 µm to over 10µm wavelength range laser diodes and their first successful growth. Jpn. J. Appl. Phys. , L876 - L879
    6. 6)
      • A. Ayabe , H. Asahi , H.J. Lee , O. Maeda , K. Konishi , K. Asami , S. Gonda . Very small temperature-dependent bandgap energy in TlInGaAs/InP doubleheterostructures grown by gas-source molecular-beam epitaxy. Appl. Phys. Lett. , 2148 - 2150
    7. 7)
      • M. Fushida , H. Asahi , K. Yamamoto , H. Koh , K. Asami , S. Gonda , K. Oe . TlGaP layers grown on GaAs substrates by gas source molecular beam epitaxy. Jpn. J. Appl. Phys. , L665 - L667
    8. 8)
      • H. Koh , H. Asahi , M. Fushida , K. Yamamoto , K. Takenaka , K. Asami , S. Gonda , K. Oe . Photoconductance measurement on TlInGaP grown by gas source MBE. J. Cryst. Growth , 107 - 112
http://iet.metastore.ingenta.com/content/journals/10.1049/el_20010012
Loading

Related content

content/journals/10.1049/el_20010012
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading