Ultra-low threshold current density ZnCdSe SQW laser fabricated by implantation-induced disordering

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Ultra-low threshold current density ZnCdSe SQW laser fabricated by implantation-induced disordering

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Implantation-induced disordering is applied to define laterally structured waveguiding in ZnCdSe single quantum well lasers. Owing to the intermixing-induced lateral step of the refractive index, the emission characteristics are significantly improved. A reduction in the threshold current density from 276 to 96 A/cm2 is achieved.

Inspec keywords: quantum well lasers; current density; laser beams; optical fabrication; II-VI semiconductors; waveguide lasers; refractive index; cadmium compounds; zinc compounds; laser variables measurement; semiconductor doping; ion implantation

Other keywords: fabrication; refractive index; SQW laser; emission characteristics; laterally structured waveguiding; ultra-low threshold current density; implantation induced disordering; single quantum well lasers; threshold current density; ZnCdSe laser; ZnCdSe; intermixing-induced lateral step

Subjects: Doping and implantation of impurities; Optical variables measurement; Semiconductor doping; Laser beam characteristics and interactions; Optical fabrication, surface grinding; Lasing action in semiconductors; Laser beam interactions and properties; Design of specific laser systems; Semiconductor lasers

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