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SiO thin film vertical diffraction gratings fabricated on Si substrates by the use of an advanced glancing angle deposition (GLAD) technique are demonstrated. Diffraction gratings with variable groove heights and variable grating periods ranging from 100 nm to 10 µm are fabricated in a one-step deposition process. Gratings fabricated with this technique have potential applications in integrated photonic devices.
Inspec keywords: integrated optics; optical fabrication; vapour deposition; diffraction gratings; silicon compounds
Other keywords:
Subjects: Integrated optics; Integrated optics; Gratings, echelles; Other thin film deposition techniques; Ion plating and other vapour deposition; Optical fabrication, surface grinding