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P/He ion implant isolation technology for AlGaN/GaN HFETs

P/He ion implant isolation technology for AlGaN/GaN HFETs

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A novel process for the isolation of AlGaN/GaN HFETs is reported, utilising co-implantation of phosphorus and He ions. After implantation the material sheet resistance is > 108 Ω/□, even at temperatures as high as 200°C. The high resistance is maintained for high temperature anneals > 700°C. HFETs fabricated with this procedure exhibit good characteristics.


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