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Moire phase masks for automatic pure apodisation of fibre Bragg gratings

Moire phase masks for automatic pure apodisation of fibre Bragg gratings

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A Moire technique is used in the fabrication of a diffractive phase mask by electron beam lithography. The phase mask has a varying diffraction efficiency designed to produce apodised fibre Bragg gratings with a uniform ultraviolet beam exposure. Since the illumination is uniform, the average induced refractive index is constant along the grating and pure apodisation results.

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