Planar Be-doped VCSELs with high wallplug efficiencies

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Planar Be-doped VCSELs with high wallplug efficiencies

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The fabrication of planar, proton implanted vertical-cavity lasers (VCSELs) with low threshold voltages of 1.8 V and high wallplug efficiencies of 17.6% for top surface emission is reported. The maximum output power of 25 µm devices is 12.5 mW. Layer structures containing simple single-step graded AlGaAs-GaAs Bragg reflectors were grown by solid source molecular beam epitaxy with beryllium as p-type dopant.

Inspec keywords: aluminium compounds; gallium arsenide; surface emitting lasers; molecular beam epitaxial growth; optical fabrication; ion implantation; beryllium; semiconductor lasers; III-V semiconductors

Other keywords: 17.6 percent; planar Be-doped VCSELs; wallplug efficiencies; layer structures; fabrication; output power; p-type dopant; threshold voltages; surface emission; 1.8 V; 12.5 mW; solid source molecular beam epitaxy; proton implanted vertical-cavity lasers; single-step graded AlGaAs-GaAs Bragg reflectors; AlGaAs-GaAs:Be

Subjects: Vacuum deposition; Epitaxial growth; Semiconductor doping; Laser resonators and cavities; Semiconductor lasers; Lasing action in semiconductors; Laser resonators and cavities; Optical fabrication, surface grinding

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