Pearton, S.J.; Abernathy, C.R.; Vartuli, C.B.; Mackenzie, J.D.; Shul, R.J.; Wilson, R.G.; Zavada, J.M.: 'Hydrogen incorporation in GaN, AlN, and InN during Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/Ar ECR plasma etching', Electronics Letters, 1995, 31, (10), p. 836-837, DOI: 10.1049/el:19950558
IET Digital Library, https://digital-library.theiet.org/;jsessionid=25rra2s5uue4x.x-iet-live-01content/journals/10.1049/el_19950558