New lithography techniques for electrode widths of less than 60 nm are proposed. The electrodes are fabricated by using extremely thin anodic oxidation films (AOFs) as resists. 60 nm-wide electrodes were obtained by using a wet etching technique and 100 nm-wide electrodes by using a dry etching technique. The experimental results of a 10 GHz surface acoustic wave filter with an insertion loss of 15 dB are also presented for an 80 nm-wide electrode.