High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser
High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser
- Author(s): P.E. Dyer ; R.J. Farley ; R. Giedl ; K.C. Byron ; D. Reid
- DOI: 10.1049/el:19940580
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- Author(s): P.E. Dyer 1 ; R.J. Farley 1 ; R. Giedl 1 ; K.C. Byron 2 ; D. Reid 3
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View affiliations
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Affiliations:
1: Department of Applied Phys., University of Hull, Hull, United Kingdom
2: Department of Applied Phys., BNR Europe Ltd., Harlow, United Kingdom
3: Department of Applied Phys., GEC-Marconi Materials Technology, Towcester, United Kingdom
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Affiliations:
1: Department of Applied Phys., University of Hull, Hull, United Kingdom
- Source:
Volume 30, Issue 11,
26 May 1994,
p.
860 – 862
DOI: 10.1049/el:19940580 , Print ISSN 0013-5194, Online ISSN 1350-911X
High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation (~10 pulses) at modest fluences (~400 m Jcm-2).
Inspec keywords: reflectivity; optical fibres; light absorption; laser beam effects; diffraction gratings
Other keywords:
Subjects: Fibre optics; Optical propagation, dispersion and attenuation in fibres; Gratings, echelles; Laser beam characteristics and interactions; Laser beam interactions and properties
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