Formation of optical slab waveguides using thermal oxidation of SiOx

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Formation of optical slab waveguides using thermal oxidation of SiOx

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© The Institution of Electrical Engineers
Published

A novel method for the fabrication of optical slab waveguides is presented. After growth of the base cladding by thermal oxidation and deposition of the core layer of the waveguide by PECVD of SiOx, the top cladding layer is formed from the core layer material by an additional thermal oxidation which transforms SiOx, into SiO2. With this simple technology, contaminations and rough interfaces between core and cladding are avoided. Low propagation losses and good matching to optical fibres are achieved.

Inspec keywords: silicon compounds; optical waveguides; optical workshop techniques; optical losses; oxidation

Other keywords: Si; fabrication; silica waveguides; propagation losses; optical slab waveguides; SiO2; PECVD; cladding layer; core layer material; Si-SiO2-SiOx; thermal oxidation

Subjects: Optical fabrication, surface grinding; Optical waveguides; Optical waveguides and couplers; Surface treatment and degradation in semiconductor technology

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