High efficiency (1.2 mW/mA) top-surface-emitting GaAs quantum well lasers

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High efficiency (1.2 mW/mA) top-surface-emitting GaAs quantum well lasers

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Highly efficient (1.2 mW/mA, >70% CW differential quantum efficiency), top-surface-emitting, vertical cavity lasers are achieved at room temperature. Buried damage layers by proton implantation are used for efficient current funnelling. The CW threshold currents are 3.5–8.0 mA, at 3.7–4.2 V bias, for 10.30 μm diameter lasers. The lasing wavelengths are 845–848 nm.

Inspec keywords: semiconductor quantum wells; III-V semiconductors; semiconductor junction lasers; gallium arsenide

Other keywords: 3.5 to 8 mA; GaAs quantum well lasers; diameter; CW operation; 70 percent; lasing wavelengths; room temperature; current funnelling; semiconductors; top-surface-emitting; 3.7 to 4.2 V; vertical cavity lasers; 845 to 848 nm; CW threshold currents; 10 to 30 micron; high efficiency lasers; proton implantation

Subjects: Design of specific laser systems; Semiconductor junctions; Lasing action in semiconductors; Semiconductor lasers; II-VI and III-V semiconductors

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