Delta doped tunnel diode: a new negative differential resistance device

Access Full Text

Delta doped tunnel diode: a new negative differential resistance device

For access to this article, please select a purchase option:

Buy article PDF
£12.50
(plus tax if applicable)
Buy Knowledge Pack
10 articles for £75.00
(plus taxes if applicable)

IET members benefit from discounts to all IET publications and free access to E&T Magazine. If you are an IET member, log in to your account and the discounts will automatically be applied.

Learn more about IET membership 

Recommend Title Publication to library

You must fill out fields marked with: *

Librarian details
Name:*
Email:*
Your details
Name:*
Email:*
Department:*
Why are you recommending this title?
Select reason:
 
 
 
 
 
Electronics Letters — Recommend this title to your library

Thank you

Your recommendation has been sent to your librarian.

A novel tunnel diode is proposed. Modulation doping is used to define a two dimensional electron or hole gas on either side of a p–n junction tunnelling barrier. The additional parameter of doping spike separation enables a wide range of I–V characteristics to be selected. This leads to a decoupling of the current peak and corresponding voltage. Improvements in current density and speed are predicted.

Inspec keywords: semiconductor doping; tunnel diodes; semiconductor device models; p-n homojunctions

Other keywords: decoupling of current peak; 2D hole gas; p-n junction tunnelling barrier; negative differential resistance device; speed; modulation doping; I-V characteristics; 2D electron gas; current density; delta doped tunnel diode; doping spike separation

Subjects: Semiconductor junctions; Semiconductor doping; Semiconductor device modelling, equivalent circuits, design and testing; Junction and barrier diodes

References

    1. 1)
      • D. Meyerhofer , G.A. Brown , H.S. Sommers . Degenerate germanium tunnel, excess and thermal current in tunnel diodes. Phys. Rev. , 1329 - 1341
    2. 2)
      • E.O. Kane . Theory of tunneling. J. Appl. Phys. , 83 - 91
    3. 3)
      • L. Esaki . New phenomenon in narrow germanium p–n junctions. Phys. Rev. , 603 - 604
    4. 4)
      • Nagakawa, K., Van Gorkum, A.A., Shiraki, Y.: `Atomic layer doping (ALD) technology in Si and its application to a new structure FET', 5th Int. Conf., 1988, Sapporo, Japan, MBE-V Sapporo, p. 242–245, Molecular beam epitaxy 1988.
    5. 5)
      • U. Kunze , G. Lautz . Tunnel spectroscopy of subband structure in n-inversion layers on (111) and (100) Si surfaces. Surf. Sci. , 55 - 68
    6. 6)
      • T.J. Shewchuk , P.C. Chapin , P.D. Coleman , W. Kopp , R. Fischer , H. Morkoc . Resonant tunneling oscillations in a GaAs-AlGaAs heterostructure at room temperature. Appl. Phys. Lett. , 508 - 510
    7. 7)
      • J.P. Leburton , J. Kolodzey , S. Briggs . Bipolar tunneling field-effect transistor: A three-terminal negative differential resistance device for high-speed applications. Appl. Phys. Lett. , 1608 - 1610
    8. 8)
      • E.F. Schubert , J.E. Cunningham , W.T. Tsang . Electronmobility enhancement and electron-concentration enhancement in delta-doped n-GaAs at T = 300 K. Sol. Stat. Commun. , 591 - 594
http://iet.metastore.ingenta.com/content/journals/10.1049/el_19900395
Loading

Related content

content/journals/10.1049/el_19900395
pub_keyword,iet_inspecKeyword,pub_concept
6
6
Loading