Novel optically excited resonant pressure sensor

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Novel optically excited resonant pressure sensor

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© The Institution of Electrical Engineers
Published

A novel pressure sensitive microresonator structure has been fabricated by anisotropic etching of silicon. An intensity modulated laser beam is focused onto the resonator and generates transverse vibrations, which are detected using optical heterodyne interferometric techniques. The pressure and temperature dependence of the resonant frequency of this structure is reported.

Inspec keywords: nonelectric sensing devices; elemental semiconductors; silicon; etching; light interferometry; pressure measurement

Other keywords: intensity modulated laser beam; Si; optically excited resonant pressure sensor; microresonator structure; resonant frequency; optical heterodyne interferometric techniques; temperature dependence; transverse vibrations; anisotropic etching

Subjects: Sensing and detecting devices; Sensing devices and transducers; Optical interferometry; Pressure and vacuum measurement; Surface treatment (semiconductor technology)

References

    1. 1)
      • D. Uttamchandani , K.E.B. Thornton , B. Culshaw . Optically excited resonant diaphragm pressure sensor. Electron. Lett. , 152 - 153
    2. 2)
      • M.V. Andres , K.W.H. Foulds , M.J. Tudor . Optical activation of a silicon vibrating sensor. Electron. Lett. , 1097 - 1099
    3. 3)
      • S. Venkatesh , B. Culshaw . Optically excited vibrations in a micromachined silica structure. Electron. Lett. , 315 - 317
    4. 4)
      • K.E.B. Thornton , D. Uttamchandani , B. Culshaw . Temperature dependence of resonant frequency in optically excited diaphragms. Electron. Lett. , 1232 - 1234
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