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GaInAs PIN photodiodes grown by atmospheric-pressure MOVPE

GaInAs PIN photodiodes grown by atmospheric-pressure MOVPE

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GaInAs/InP PIN photodiodes with low dark currents and capacitances have been successfully fabricated from material grown by atmospheric-pressure MOVPE. Both Zn-diffused and grown-in p+-n homojunction material have provided yields of over 70% for devices with leakage currents less than 20 nA. This growth technique, therefore, looks particularly appropriate for a reproducible, high-yield and inexpensive method of photodetector production.

References

    1. 1)
      • P. Cinguino , F. Genova , C. Rigo , A. Stano . Low dark current InGaAs PIN photodiodes grown by MBE. Electron. Lett. , 139 - 140
    2. 2)
      • R.H. Moss , S. Ritchie . The development of GalnAs for photodetectors. Br. Telecom. Tech. J. , 7 - 22
    3. 3)
      • Poulain, P., Razeghi, M., Hirtz, P., Kazermierski, K., de Cremous, B.: `Zn diffused InGaAs InP PIN-DH photodiodes grown by low pressure MOCVD', Proceedings of 9th IEEE inter-national semiconductor laser conference, 1984, Rio de Janeiro, (to be published in IEEE J. Quantum Electron.).
    4. 4)
      • E.O. Goebel , T. Pearsall . (1982) Photoluminescence and optical gain of GaInAsP, GalnAsP alloy semiconductors.
    5. 5)
      • A.K. Chatterjee , M.M. Faktor , M.H. Lyons , R.H. Moss . Vapour phase hetero-epitaxy: growth of GalnAs layers. J. Cryst. Growth , 591 - 604
    6. 6)
      • T.P. Lee , C.A. Burrus , A.G. Dentai . InGaAs/InP p-i-n photodiodes for lightwave communications at the 0.95–1.65 μm wavelength. IEEE J. Quantum Electron. , 232 - 238
    7. 7)
      • D.R. Smith , R.C. Hooper , P.P. Smyth , D. Wake . Experimental comparison of a germanium APD and InGaAs PINFET receiver for long wavelength optical communication systems. Electron. Lett. , 453 - 454
    8. 8)
      • G.H. Olsen . Low leakage, high efficiency, reliable VPE InGaAs 1.0–1.7 μm photodiodes. IEEE Electron Device Lett. , 217 - 219
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