Shallow p+ layers in In0.53Ga0.47As by Hg implantation

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Shallow p+ layers in In0.53Ga0.47As by Hg implantation

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We demonstrate for the first time a shallow p+n homojunction fabricated on In0.53Ga0.47As by mercury ion implantation. Implanted mercury behaves as an acceptor in In0.53Ga0.47As and does not diffuse towards the bulk. Mercury implantation can be a good technique in realising a shallow p+n junction in GaInAs.

Inspec keywords: p-n homojunctions; ion implantation; III-V semiconductors; carrier density; mercury (metal); indium compounds; gallium arsenide

Other keywords: In0.53Ga0.47As; carrier distribution; shallow p+ layers; Hg implantation; In0.53Ga0.47As:Hg; acceptor; III-V semiconductor; ion implantation; shallow p+-n homojunction

Subjects: Doping and implantation of impurities; Electrical properties of semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions; Semiconductor junctions; II-VI and III-V semiconductors; Semiconductor doping

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