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Photodiodes have been made in epitaxial layers of InAsxP1−x grown by molecular-beam epitaxy on InP substrates The As-P ratio of this material system can be adjusted to produce photodetectors for the 2–3 μm-wavelength region. Initial devices exhibit cutoff wavelengths as long as 2 μm.
References
-
-
1)
-
Li Tingye
.
Advances in optical fiber communications: A historicat perspective.
IEEE J. Sel. Areas Commun.
-
2)
-
T. Miyashita ,
T. Manabe
.
Infrared optical fibers.
IEEE J. Quantum Electron.
-
3)
-
W.T. Tsang
.
The growth of bright (300 K) luminescent InAsxP1−x (1.7–2.1 μm) on InP substrates by molecular beam epitaxy.
J. AppI. Phys.
-
4)
-
Kasper, B.L., Linke, R.A., Campbell, J.C., Dental, A.G., Vodhanel, R.S., Henry, P.S., Kaminow, I.P., Ko, J.S.: `A 161.5 km transmission experiment at 420 Mb/s', 9th European Conference on optical communication, 1983, Geneva, PDP #7.
-
5)
-
Yoshida, S.: `Review of new materials for infrared fibers', Technical Digest 4th International Conference on integrated optics and optical fiber communication, 1983, , p. 98.
-
6)
-
W.T. Tsang ,
N.A. Olsson
.
Preparation of 1.78 μm wave-length Al0.2Ga0.8Sb/GaSb DH laser by molecular beam epitaxy.
Appl Phys. Lett.
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