InAsxP1−x/InP photodiodes prepared by molecular-beam epitaxy

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InAsxP1−x/InP photodiodes prepared by molecular-beam epitaxy

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Photodiodes have been made in epitaxial layers of InAsxP1−x grown by molecular-beam epitaxy on InP substrates The As-P ratio of this material system can be adjusted to produce photodetectors for the 2–3 μm-wavelength region. Initial devices exhibit cutoff wavelengths as long as 2 μm.

Inspec keywords: indium compounds; photodetectors; photodiodes; semiconductor epitaxial layers; III-V semiconductors

Other keywords: InAsxP1-x/InP photodiodes; cutoff wavelengths; III-V semiconductors; photodetectors; 2 microns to 3 microns wavelength; As-P ratio; molecular-beam epitaxy

Subjects: Epitaxial growth; II-VI and III-V semiconductors; Photoelectric devices

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