InP MISFETs with SiO2 as the gate insulator and a deep channel recess have been fabricated. At 9 GHz the highest power output with 4 dB gain was 3.5 W/mm gate width with 33% power added efficiency. This power is more than twice that of the best GaAs MESFET.
References
-
-
1)
-
C.N. Berglund
.
Surface states at steam grown Si-SiO2 interfaces.
IEEE Trans.
,
701 -
705
-
2)
-
M. Ito ,
S. Kagawa ,
T. Kaneda ,
T. Yamaoka
.
Ionization rates for electron and holes in GaAs.
J. Appl. Phys.
,
4607 -
4608
-
3)
-
M. Armand ,
J. Chevrier ,
N.T. Linh
.
Microwave power amplification with InP FETs.
Electron. Lett.
,
906 -
907
-
4)
-
I. Umebu ,
A.N.M.M. Choudhury ,
P.N. Robson
.
Ionization coefficients measured in abrupt InP junctions.
Appl. Phys. Lett.
,
302 -
303
-
5)
-
H.M. Macksey ,
F.H. Doerbeck
.
GaAs FETs having high output power per unit gate width.
IEEE Electron Device Lett.
,
147 -
148
-
6)
-
J. Chevrier ,
M. Armand ,
A.M. Huber ,
N.T. Linh
.
Vapor growth of InP for MESFETs.
J. Electron. Mater.
,
745 -
761
http://iet.metastore.ingenta.com/content/journals/10.1049/el_19830296
Related content
content/journals/10.1049/el_19830296
pub_keyword,iet_inspecKeyword,pub_concept
6
6