© The Institution of Electrical Engineers
Monolithic hot-beam transistors have been made in silicon with a current gain of 20 and a MAG>20 dB. Hot electrons are injected at approximately 1.7 eV, cross a ∼250 Å wide degenerate base and surmount a 0.4 eV collector barrier.
References
-
-
1)
-
J.M. Shannon
.
Calculated performance of monolithic hot-electron transistors.
IEE Proc. I, Solid-State & Electron. Devices
,
4 ,
134 -
140
-
2)
-
S.M. Sze ,
H.K. Gummel
.
Appraisal of semiconductor-metal-semiconductor transistors.
Solid-State Electron.
-
3)
-
J.M. Shannon
.
A majority carrier camel diode.
Appl. Phys. Lett.
-
4)
-
J.M. Shannon
.
Shallow implanted layers in advanced silicon devices.
J. Nuclear Instrum. & Methods
,
545 -
5552
-
5)
-
J.M. Shannon
.
Hot-electron camel transistor.
IEE J. Solid-State & Electron. Devices
,
5 ,
142 -
144
-
6)
-
B.K. Ridley
.
The diffusion of hot electrons across a semiconductor base.
Solid-State Electron.
-
7)
-
Shannon, J.M., Gill, A.: `Monolithic hot-electron transistors', paper E29, ESSDERC, 1980, York.
-
8)
-
J.M. Shannon
.
A new majority carrier diode—the camel diode.
Jpn. J. Appl. Phys.
-
9)
-
H.J. Whitlow ,
P. Blood ,
B.W. Farmery ,
D.J. O'connor ,
J.M. Shannon ,
M.W. Thompson
.
, Distribution of As and In atoms implanted in silicon at low energy.
http://iet.metastore.ingenta.com/content/journals/10.1049/el_19810435
Related content
content/journals/10.1049/el_19810435
pub_keyword,iet_inspecKeyword,pub_concept
6
6