Hole traps in n-InP by d.l.t.s. and transient capacitance techniques

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Hole traps in n-InP by d.l.t.s. and transient capacitance techniques

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The parameter of a single hole trap frequently observed in bulk and v.p.e. n-InP have been determined for the first time by both transient-capacitance and d.l.t.s. techniques. An activation energy of 270 meV and capture cross-section of 1.4=10−13 cm2 have been measured.

Inspec keywords: semiconductor epitaxial layers; indium compounds; hole traps; capacitance; III-V semiconductors; deep levels

Other keywords: n-InP; transient capacitance; deep level transient spectroscopy; DLTS; III-V semiconductors; activation energy; capture cross section; hole trap

Subjects: Electrical conductivity of II-VI and III-V semiconductors; Charge carriers: generation, recombination, lifetime, and trapping (semiconductors/insulators); Impurity and defect levels in tetrahedrally bonded nonmetals; II-VI and III-V semiconductors; Electronic properties of semiconductor thin films

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