Contact-degradation studies on GaAs transferred-electron devices using a focused backscattering technique

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Contact-degradation studies on GaAs transferred-electron devices using a focused backscattering technique

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Focused backscattering microanalysis has been used to overcome some of the problems associated with conventional backscattering. The small beam size enables the study of (a) small areas typical of real microwave devices, (b) lateral variations of the contact interdiffusion and (c) deep profiles when used in conjunction with angle lapped samples.

Inspec keywords: metallisation; particle backscattering; solid-state microwave devices; Gunn devices; III-V semiconductors; ohmic contacts

Other keywords: Gunn devices; contact interdiffusion; focused backscattering technique; deep profiles; GaAs transferred electron devices; angle lapped samples; contact degradation

Subjects: Metallisation and interconnection technology; Semiconductor-metal interfaces; Bulk effect devices; II-VI and III-V semiconductors

References

    1. 1)
      • J.A. Cookson , F.D. Pilling . The use of focussed ion beams for analysis. Thin solid films , 381 - 385
    2. 2)
      • N. Yokoyama , S. Ohkawa , H. Ishikawa . Effects of the heating rate in alloying of Au-Ge to n-type GaAs on the ohmic properties. Japan J. Appl. Phys. , 1071 - 1072
    3. 3)
      • J.C. Whitton . Removal of thin (20A) layers of metals, metal oxides and ceramics by mechanical polishing. J. Appl. Phys. , 3917 - 3922
    4. 4)
      • D.K. Brice . Theoretical analysis of the energy spectra of back-scattered ions. Thin solid films , 121 - 135
    5. 5)
      • Palmström, C.J., Morgan, D.V., Howes, M.J.: `Contact degradation of GaAs transferred electron devices', Proceedings of 3rd international conference on ion beam analysis, 1977.
    6. 6)
      • T.F. Gibbons , W.E. Beadl . Switching properties of thin NiO films. Solid-State Electron. , 785 - 797
    7. 7)
      • G.Y. Robinson . Metallurgical and electrical properties of alloyed Ni/Au-Ge films on n-type GaAs. Solid-State Electron. , 331 - 342
    8. 8)
      • J. Gyulai , J.W. Mayer , V. Rodriguez , A.Y.C. Yu , H.J. Gopen . Alloying behaviour of Au and Au-Ge on GaAs. J. Appl. Phys. , 3578 - 3585
    9. 9)
      • B.K. Ridley . Specific negative resistance in solids. Proc. Phys. Soc. , 954 - 966
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