Two-dimensional solution of the d.c. characteristics for the m.o.s.t.

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Two-dimensional solution of the d.c. characteristics for the m.o.s.t.

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A method is outlined for the determination of a 2-dimensional solution of the potential distribution in the substrate of the m.o.s.t., based on the complete depletion-neutral approximation. Channel current is derived from a 1-dimensional solution of the continuity equation along the silicon-silicon dioxide interface, for given values of extrinsically applied electrode potentials. Theoretical characteristics have been validated by comparison with those of a practical device. A discussion of pinchoff is also included.

Inspec keywords: metal-insulator-semiconductor devices; characteristics measurement

Subjects: Other electric variables measurement; Other field effect devices

References

    1. 1)
      • G.A. Armstrong , J.A. Magowan , W.D. Ryan . Optimum accelerating factor for s.o.r. solutions of domains containing δφ/δn = 0 boundary conditions. Electron. Lett. , 69 - 71
    2. 2)
      • I.A. van Nielen , O.W. Memilink . The influence of the substrate upon the d.c. characteristics of silicon m.o.s. transistors. Phil. Res. Rep. , 55 - 71
    3. 3)
      • D. Frohman-Bentchkowsky , A.S. Grove . Conductance of m.o.s. transistors in saturation. IEEE Trans. , 108 - 113
    4. 4)
      • J.E. Schroeder , R.S. Muller . I.G.F.E.T. analysis through numerical solution of Poisson's equation. IEEE Trans. , 954 - 961
    5. 5)
      • G.E. Forsyte , W.R. Wason . (1960) , Finite difference methods for partial differential equations.
    6. 6)
      • S.R. Hofstein , F.P. Heimann . The silicon insulated gate field effect transistor. Proc. Inst. Elect. Electron. Engrs. , 1190 - 1202
    7. 7)
      • D.N.G. de Allen . (1954) , Relaxation methods in engineering science.
    8. 8)
      • V.G.K. Reddi , C.T. Sah . Source to drain resistance beyond pinch-off in metal-oxide-silicon transistors. IEEE Trans. , 139 - 141
    9. 9)
      • H.W. Leob , R. Andrew , W. Love . Application of 2-dimensional solutions of the Shockley-Poisson equation to inversion-layer m.o.s.t. devices. Electron. Lett. , 352 - 354
    10. 10)
      • W. Shockley . A unipolar field effect transistor. Proc. Inst. Radio Engrs. , 1365 - 1376
    11. 11)
      • O. Leistinko , A.S. Grove , C.T. Sah . Electron and hole mobilities on thermally oxidised silicon surfaces. IEEE Trans. , 248 - 254
    12. 12)
      • J.A. Magowan , W.D. Ryan . The determination of the Laplace-Poisson interface. Electron. Lett. , 93 - 95
    13. 13)
      • C.T. Sah , H.C. Pao . The effects of fixed bulk charge on the characteristics of metal-oxide-silicon transistor. IEEE Trans. , 393 - 409
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