access icon free Characteristics of hetero-structured thermoelectric devices with a-Si/Mg2Si-stacked thin film layers

New high-quality thermoelectric devices with amorphous silicon/magnesium silicide (a-Si/Mg2Si)-stacked hetero-structure thin film layers have been fabricated using both radio frequency sputtering and rapid thermal annealing techniques. The thermoelectric properties of the a-Si/Mg2Si hetero-structure layers were found to be much superior to those of the a-Si layer.

Inspec keywords: silicon; thermoelectric devices; semiconductor heterojunctions; magnesium compounds; semiconductor thin films; sputter deposition; elemental semiconductors; rapid thermal annealing; amorphous semiconductors; semiconductor growth; thermoelectricity

Other keywords: Si-Mg2Si; rapid thermal annealing; amorphous silicon-magnesium silicide-stacked heterostructure thin film layers; heterostructured thermoelectric devices; radiofrequency sputtering

Subjects: Deposition by sputtering; Electrical properties of amorphous and glassy semiconductors (thin films, low-dimensional and nanoscale structures); Thin film growth, structure, and epitaxy; Thermoelectric effects (semiconductors/insulators); Elemental semiconductors; Electrical properties of semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions; Other semiconductor materials; Amorphous and glassy semiconductors; Sputter deposition; Other heat and thermomechanical treatments; Semiconductor junctions; Annealing processes in semiconductor technology

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http://iet.metastore.ingenta.com/content/journals/10.1049/el.2018.6352
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