access icon free Electrical and optical properties of laser irradiation treated vertical light-emitting diodes

A comparative analysis of the properties of vertical light-emitting diodes (VLEDs) fabricated using different surface treatment schemes was conducted. Compared with a conventional VLED, a light output power increase of 24.8% for an injection current of 350 mA was achieved by an n-type-gallium nitride (GaN)-based VLED with a thin undoped GaN layer and microsized protrusions produced by krypton fluoride laser irradiation using an energy density of 600 mJ/cm2. This was accomplished without noticeable degradation of the electrical properties of the device. Further, potassium hydroxide wet etching of the VLED surface increased the light output power gain to 47.3% for the same injection current.

Inspec keywords: III-V semiconductors; optical fabrication; gallium compounds; light emitting diodes; wetting; etching; wide band gap semiconductors; radiation hardening (electronics); surface treatment

Other keywords: vertical light-emitting diode; krypton fluoride laser irradiation; GaN; optical property; surface treatment scheme; potassium hydroxide wet etching; current 350 mA; microsized protrusion; electrical property; VLED; laser irradiation treatment; energy density

Subjects: Surface treatment (semiconductor technology); Radiation effects (semiconductor technology); Light emitting diodes

http://iet.metastore.ingenta.com/content/journals/10.1049/el.2016.0507
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content/journals/10.1049/el.2016.0507
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