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access icon free SPR properties of 2D ZnO nano-holes fabricated by laser interference lithography

  • Author(s): S.H. Kim 1 ; D.G. Kim 2 ; B.H. Lee 3 ; T.U. Kim 2 ; H.C. Ki 2 ; H.J. Kim 2 ; Y.W. Choi 3 ; B.-T. Lee 1
    • View affiliations
    • Affiliations: 1: Department of Materials Science and Engineering, Chonnam National University, 300 Yong-bong dong, Gwangju 500-757, Republic of Korea;
      2: Photonics Fusion System Research Center, Korea Photonics Technology Institute, Gwangju 500-779, Republic of Korea;
      3: School of Electrical and Electronics Engineering, Chung-Ang University, 221 Heuk-suk dong, Seoul 156-756, Republic of Korea
  • Source: Volume 49, Issue 8, 11 April 2013, p. 551 – 552
    DOI:  10.1049/el.2013.0574 , Print ISSN 0013-5194, Online ISSN 1350-911X
© The Institution of Engineering and Technology
Received 18/02/2013, Published
Errata or comment

ZnO nanostructures are proposed to enhance the performance of surface plasmon resonance (SPR). The ZnO nanostructures on a 50 nm-thick Au thin-film are composed of nano-holes with a period of 300 nm. The ZnO nano-holes coupled SPR was simulated using the three-dimensionanl finite-difference time-domain method. The ZnO nano-holes have been fabricated by a laser interference lithography and wet etching process. The measured resonance angle of 47.5° was obtained; this agreed well with the simulated result. In comparison with the author's previous report, the figure of merit of ZnO nano-holes coupled SPR was two times higher than that of the ZnO grating structure.

Inspec keywords: nanolithography; II-VI semiconductors; wide band gap semiconductors; nanofabrication; semiconductor growth; laser materials processing; nanostructured materials; etching; finite difference time-domain analysis; zinc compounds; surface plasmon resonance

Other keywords: grating structure; 2D nanoholes; Au thin-film; surface plasmon resonance; Au; figure of merit; ZnO; size 50 nm; three-dimensionanl finite-difference time-domain method; laser interference lithography; SPR properties; wet etching

Subjects: Nanometre-scale semiconductor fabrication technology; Laser materials processing; Lithography (semiconductor technology); Surface treatment (semiconductor technology); Laser materials processing; Nanolithography; Collective excitations (surface states); Surface treatment and degradation in semiconductor technology; II-VI and III-V semiconductors

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